These thin Si microgrooved wafers are coated with a 20 nm thick layer of indium tin oxide (ITO). The ITO was deposited by RF magnetron sputtering and has been thermally annealed to improve chemical resistance. The wafers have a groove angle of 35 degrees.

By electrodepositing various metals onto these ITO-coated wafers, users can create excellent metal thin film electrodes for surface-enhanced IR measurements. Electrodeposited metal films on ITO have good surface adhesion and high signal enhancement.

These wafers have the same dimensions as our uncoated wafers (9 x 11 mm) and are compatible with all wafer versions of Jackfish cells.

Resources

User guide for electrodepositing a SEIRAS-active gold film on ITO

Blog post comparing techniques for preparing ATR-SEIRAS films